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Style Works Xt Universal Full Version
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The present invention relates generally to design and manufacture of integrated circuits, and, more particularly, to handling of mask processes in a computer aided design and manufacturing system.
2. Related Art
As the size of semiconductor devices continues to shrink, the corresponding design rules continue to shrink as well. Because of the tight tolerances associated with the shrinking of the design rules, mask processes that are used to form various patterns on a wafer are beginning to make the fabrication of certain semiconductor devices difficult or impossible. In particular, the traditional use of photolithography, wherein a photomask is created that has a predetermined pattern thereon, and the photomask is exposed, and subsequently the photomask is transferred to a wafer using a stepper, is becoming more difficult as design rules shrink. In particular, a difference between the desired pattern on the photomask and the transferred pattern on the wafer is often referred to as “process window.” When the process window gets too small, the design rule cannot be met. Therefore, it is likely that for a given feature size on the photomask, the corresponding feature size on the wafer will be too large or too small, or both. As a result, the yield of semiconductor devices during the manufacturing process will drop.
The most prevalent cause of the process window shrinkage is that the image on the photomask is not a perfect copy of the design on the photomask. Since the mask image of a given mask level is going to be transferred to a wafer, the mask image is created on the photomask and then transferred to the wafer. The process window is thus a measure of how well the imaging elements of the photomask transfer an image to the wafer. Thus, any non-perfect imaging elements reduce the size of the process window.
A second cause of process window shrinkage is that the resolution of the imaging elements (referred to as the “resolving power” of the imaging elements) of the photomask is not large enough to form the desired pattern on the
Offline. “Eintrag Verfahren im Meta-Thema aus. Presse und Berater befragen sie durch die. aktuelle Rechnung auswerten, das können sie auf das PROBRÄ.@page “/domelements/splitviewcontrol/cascading” @using Syncfusion.Blazor.DotNetBlazor @inherits SampleBaseComponent; This sample illustrates the SplitView Control. The SplitView control contains the Splitter which splits the parent element into two child elements. It is used to share different contents for a single parent element across the two child elements. This sample demonstrates the use of the SplitView Control with Cascading Style Sheet (CSS) support. This control can be used with either the default SplitView control or the Waterfall style. The SplitView is nested inside a Border element. The width and height values for the parent can be adjusted to fit the container inside a container. This example demonstrates the following: SplitView Control with Cascading Styles Waterfall Style 50b96ab0b6
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